Physical Vapor Deposition Market Analysis

 Process (Thermal Evaporation, Sputtering, IonPlating)

Sputtering segment is anticipated to account for physical vapor deposition market share of around 48.1% by 2036 on account of its widespread use and significant advantages in various applications. For instance, sputtering is extensively used for depositing thin films in semiconductor devices, including metallization, dielectric layers, and interconnects.  As semiconductor devices become more advanced, sputtering technology continues to evolve to meet these needs. Further, for applications such as touchscreens and LED displays, sputtering is used to deposit transparent conductive oxides like indium oxide (ITO). These materials provide conductivity while remaining transparent to visible light.

Additionally, optical filter manufacturers frequently use sputtering technology to produce high-precision filters. Sputtering is particularly well-suited for this application due to its ability to deposit thin, uniform layers with precise control over thickness and composition. For instance, Semrock, a business unit of IDEX Health & Science, manufactures all of its optical filters using sophisticated Ion Beam Sputtering (IBS) technology, resulting in patented state-of-the-art filters with exceptionally durable hard glass coatings on a single hard glass substrate.

End-user (Electronics Semiconductors, Automotive, Aerospace & Defense, Healthcare, Energy, Packaging, Industrial)

The electronics semiconductors segment is expected to register significant physical vapor deposition market revenue in the coming years. This growth is attributed to an increase in demand for microelectronics led by technological advancements, a growing need for smart gadgets, and the adoption of cutting-edge innovations including 5G and artificial intelligence (AI). For instance, the global microelectronics industry reached over USD 325 billion in 2022.

Additionally, AI and machine learning algorithms are increasingly used to optimize the design of semiconductor devices and improve manufacturing processes. In the context of PVD, AI can help refine deposition techniques, improve film uniformity, and predict the outcomes of different deposition parameters, leading to higher quality and performance of semiconductor components.

Our in-depth analysis of the physical vapor deposition market includes the following segments: