Material (Pure Metal, Compound, Alloy, Isotope, Oxide Targets)
Sputtering target market from the pure metal targets segment is set to generate the highest revenue by the end of 2036. This growth is poised to be influenced by a surge in the use of pure metal targets in different configurations including planar, circular, rectangular, and more for the process of sputter and evaporation. The rise in the production of high-index films for infrared filters, ferromagnetic thin films, semiconducting films, photoconductive films, and lubricating films using these targets also contributes to this segment’s revenue gain.
Sputtering Method (Radio Frequency, Direct Current, Reactive, Magnetron, Gas Flow, Ion-assisted Sputtering)
The magnetron sputtering segment in the sputtering target market is expected to have significant growth shortly. This is owing to the use of magnetron sputtering methods in various industrial applications including the production of corrosion-resistant and low-friction coatings.
Our in-depth analysis of the global market includes the following segments:
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Sputtering Method |
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Author Credits: Abhishek Verma
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